To address the urgent issue of how to manage process variability in the early stages of design creation, Mentor Graphics Corp. today announced its production-proven Calibre Litho-Friendly Design (LPD) ...
NVIDIA’s cuLitho software library for computational lithography is being integrated by TSMC, ASML and into their software, manufacturing processes and systems for NVIDIA’s Hopper architecture GPUs. “ ...
ALLENTOWN, Pa. — TEA Systems Corp. introduced Weir PW, a software suite for process control in lithography applications. Using custom models for wafer and field systematic applications, the software ...
Design for manufacturing (DFM) has been an industry buzz word for several years, but now that it is an expected part of every design flow at 40nm and below, we are seeing how the concept of DFM can be ...
Record number of papers at SPIE Advanced Lithography reports imec's progress in advanced lithography
(Nanowerk News) At next week’s SPIE Advanced Lithography Conference, to be held February 22 - 26 in San Jose, California, imec technologists contribute in a record number of over 30 papers showing ...
Over the past few years we’ve seen several impressive projects where people try to manufacture integrated circuits using hobbyist tools. One of the most complex parts of this process is lithography: ...
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